IBM’s Vermont facility has received a Most Valuable Pollution Prevention (MVP2) award from the National Pollution Prevention Roundtable for the development of a manufacturing process that reduces IBM’s greenhouse gas use by nearly 12,000 metric tons annually.
The MVP2 awards are presented each year by the NPPR to celebrate the successes of innovators in the areas of pollution prevention and sustainability.
Jennifer Robbins of Richmond, Vermont and Thai Doan of Burlington, Vermont, standing outside of Vermont U.S. Senator Bernie Sanders’ office in Washington, received a Most Valuable Pollution Prevention award on behalf of IBM’s Vermont facility. Jennifer is holding the award and Thai is holding a silicon wafer with chips manufactured by IBM. IBM received the award from the National Pollution Prevention Roundtable for its development of a manufacturing process that reduces IBM’s greenhouse gas use by nearly 12,000 metric tons annually.
IBM was recognized for making an improvement in the manufacturing process used to etch circuitry on microchips produced for use in cell phones and other mobile products. IBM’s chip process enables smartphones with stronger signals, longer battery life and the production of smaller devices.
A Vermont IBM engineering team developed changes in the process and the manufacturing equipment that led to a significant reduction of two greenhouse gases. At the same time, the team saw a marked improvement in the manufacturing process time, as well as chemical and equipment cost savings.
IBM will share its new process improvement with other semiconductor companies around the world.
Jeffrey Burke, executive director of NPPR, said ‘These organizations have clearly demonstrated that pollution prevention is beneficial to both the environment and the economy. They are being recognized for their leadership and commitment to promoting a sustainable future’.
For more information on the MVP2 Awards and NPPR, visit www.p2.org.
ESSEX JUNCTION, VT, October 24, 2013 ‘ IBM